Product Description
The Agilent 7700 ICP-MS is engineered for high-purity material analysis, making it an ideal solution for the semiconductor industry and other applications requiring ultra-trace element detection. With its high-efficiency sample introduction system, advanced reaction cell technology, and unmatched cool plasma capability, the 7700s delivers superior interference removal and precision, ensuring the highest analytical accuracy in well-characterized matrices such as Ultra Pure Water.
Key Features & Benefits
- Optimized for Semiconductor Applications – Designed to meet the demanding purity requirements of the semiconductor industry with high sensitivity and precision.
- Advanced Interference Removal – The 3rd generation Octopole Reaction System (ORS3) improves ion focusing and increases collision efficiency for superior elimination of polyatomic interferences.
- Seamless Transition from Cool Plasma – Industry-leading cool plasma capability simplifies the measurement of easily ionized elements, making the transition from older cool plasma systems effortless.
- Versatile Analysis in High-Purity Matrices – Capable of executing all standard semiconductor analytical methods on a single instrument.
- Enhanced Performance with Optional Gas Lines – Features a standard 5th plasma gas line and a second reaction cell gas line for greater flexibility in interference reduction.
Specifications
- Dimensions: 39 in W x 39 in D x 34 in H
- Weight: 79 lbs (36 kg)
- Power Requirements: 50 Hz motor power
- Pump Rate: 0.30 kg/h
- Argon Gas Purity: Required for operation
Why Choose GMI Certified Pre-Owned?
- Expertly Refurbished & Tested – Our factory-trained engineers ensure each system meets OEM performance standards.
- Cost-Effective Solution – Get premium performance at a fraction of the cost of a new instrument.
Equip your lab with the precision and reliability of the Agilent 7700 ICP-MS. Contact GMI today for a quote or more information.






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